ROSATOM KAMENNY-VEK OCSiAl SEMICONDUCTOR OTHER PRODUCTS
고객센터
02-2665-4577
상담시간
평일
09:30 ~ 16:00
주말
09:30 ~ 16:00
일요일/공휴일/상담가능
▣ ALD/CVD Precursors
- ALD/CVD의 증착 과정
- ALD/CVD의Mechanism
  • CVD(Chemical Vapor Deposition)
  • ALD(Atomic Layer Deposition)
- 제품의 종류
Abbr. Chemical formula V.P. at T
Al2O3 TMA Al(CH3)3 8.7 torr at 20 ℃
HfO2 TEMAHf Hf[(C2H5)(CH3)N]4 1.2 torr at 60 ℃
HfCl4 HfCl4 1 torr at 190 ℃
ZrO2 TEMAHZr Zr[(C2H5)(CH3)N]4 1 torr at 70 ℃
ZrCl4 ZrCl4 1 torr at 186 ℃
TiN TiCl4 TiCl4 1 torr at 20 ℃
TDMAT Ti[N(CH3)2]4 1 torr at 60 ℃
TaN TaCl5 TaCl5 1 torr at 111 ℃
기타 DEZ, DMCd, TEA, DMA etc.